₹ 155000 exc. gst
CAS No.: 1317-33-5 (MoS2); 60676-86-0 (SiO2)
NOTE: Each piece is unique and the technical information below and TDS are for reference only.
1. Preparation Method
Mechanical Exfoliation Method
2. Characterizations
| Substrate: | SiO2 Substrate |
| Substrate size: | 10 mm x 10 mm |
| Monolayer MoS2 Area: | ＞10 µm2 |
Typical Image of Mechanically Exfoliated Monolayer MoS2 on SiO2 substrate
Typical AFM Image of Mechanically Exfoliated Monolayer MoS2 on SiO2 substrate
3. Application Fields
An excellent device materials for studying the number of layers and fluorescence effects.
1. What is the thickness of the SiO2 layer of Mechanically Exfoliated Monolayer MoS2 on SiO2 Substrates? Is this a natively oxidized layer or a thermally oxidized layer?
The thickness of SiO2 layer is about 300nm, and it’s a thermally oxidized layer.
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| Type | Al2O3 Substrate, Sapphire Substrate, SiO2 Substrate |
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